A study of fabrication condition of GeO2layer in HfO2/GeO2/Ge structure

Presentation information

Oral presentation

13 Semiconductors » 13.3 Insulator technology

Tue. Sep 5, 2017 9:00 AM - 12:00 PM C11 (Office 1)

Masato Koyama(TOSHIBA), Akio Ohta(Nagoya Univ.)

10:15 AM - 10:30 AM

〇Shotaro Wachi¹, Yoshitaka Iwazaki¹, Tomo Ueno¹, Koji Yamada¹, Yoshinori Kitahara¹, Mitaro Namiki¹ (1.Noko Univ.)

Keywords:germanium