[5p-A204-1~9] Science of impurity control in silicon wafers

[5p-A204-9] Influence of metal impurities and others on performance of CMOS image sensors

〇Nobuhiko SATO¹ (1.Canon Inc.)

Keywords:CMOS image sensor, metal contamination

The CMOS image sensor has rapidly evolved with increase of the number of the pixels and improvement of the sensitivity. Noise and its cause limiting the sensitivity improvement is reported. Because the level of the metal impurities detected by the CMOS image sensors is less than that of the general physical chemistry analysis technique, both monitoring method with higher sensitivity and gettering technique for metal impurities is highly required.