3:00 PM - 3:15 PM
[5p-C11-5] Surface roughness increase induced by step etching of SiO2 film on Si
Keywords:SiO2, roughness, density
Presentation information
Oral presentation
13 Semiconductors » 13.3 Insulator technology
[5p-C11-1~10] 13.3 Insulator technology
6.1と13.3と13.5のコードシェアセッションあり
Tue. Sep 5, 2017 1:45 PM - 4:30 PM C11 (Office 1)
Masao Inoue(Renesas), Takanobu Watanabe(Waseda Univ.)