[5p-S42-1~15] 7.3 Micro/Nano patterning and fabrication

△ [5p-S42-8] Fabrication of a biomimetic inspired 3D mold by using acceleration and dose modulation electron beam lithography

〇Kohei Goto¹, Taniguchi Jun¹ (1.TUS)

Keywords:Nanoimprint mold, Electron beam lithography, Acceleration voltage modulation

Our previously report reveals precise depth control is possible with changing the acceleration voltage. In this study, we propose a new three-dimensional structure fabrication method combined with acceleration and dose modulation method. The target structure was a biomimetic inspired 3D funnel structure. We succeeded in producing a target three dimensional structure with three different accelerating voltages and three doses. In addition, we succeeded in obtaining a replicated pattern by UV-NIL using this structure.