The 78th JSAP Autumn Meeting, 2017

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7 Beam Technology and Nanofabrication » 7.5 Ion beams

[6p-S41-1~10] 7.5 Ion beams

Wed. Sep 6, 2017 1:30 PM - 4:15 PM S41 (Conf. Room 1)

Satoshi Abo(Osaka Univ.), Toshio Seki(Kyoto Univ.)

3:30 PM - 3:45 PM

[6p-S41-8] Surface structure after etching with ClF3 neutral cluster

〇Toshio Seki1, Tadashi Shojo2, Kunihiko Koike2, Takaaki Aoki3, Jiro Matsuo1 (1.Graduate School of Engineering, Kyoto Univ., 2.Iwatani Corp., 3.ACCMS, Kyoto Univ.)

Keywords:cluster, neutral beam, etching