[7a-C21-1~13] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[7a-C21-6] Dynamic observation study on the crystallization process of amorphous silicon by means of in situ XRD and TEM

〇Riichiro Takaishi¹, Kiwamu Sakuma¹, Takanori Asano¹, Masumi Saito¹, Hiroki Tanaka¹, Yukiko Daigo², Yutaka Fukushima² (1.Toshiba Corp., 2.Toshiba Nanoanalysis Corp.)

Keywords:poly-Si, XRD, TEM