[8a-PB4-1~20] 8.3 Plasma deposition of thin film and surface treatment

△ [8a-PB4-4] Effects of gas pressure on crystal quality of ZION films fabricated by RF magnetron sputtering

〇Liu Shi¹, Nanoka Miyahara¹, Daisuke Yamashita¹, Hyunwoong Seo¹, Kazunori Koga¹, Masaharu Shiratani¹, Naho Itagaki¹ (1.Kyushu Univ.)

Keywords:ZION films, sputtering