The 78th JSAP Autumn Meeting, 2017

Presentation information

Poster presentation

8 Plasma Electronics » 8.3 Plasma deposition of thin film and surface treatment

[8a-PB4-1~20] 8.3 Plasma deposition of thin film and surface treatment

Fri. Sep 8, 2017 9:30 AM - 11:30 AM PB4 (P)

9:30 AM - 11:30 AM

[8a-PB4-5] Behavior of species in HiPIMS using carbon target

〇(M1)Kazunori Iga1, Takayuki Ohta1, Akinori Oda2, Hiroyuki Kousaka3 (1.Meijo Univ., 2.Chiba Inst. Technol., 3.Gifu Univ.)

Keywords:diamond-like carbon, high-power impulse magnetron sputtering, optical emission spectroscopy

In this study, temporal variation of emission intensity of Ar and Ar+ were measured in HiPIMS using optical emission spectroscopy. The pulse width was changed to 8.4 μs, 18.4 μs, and 28.4 μs. The emission intensity of Ar+ increased later than Ar. This is due to the difference between the excitation energy and the ionization energy of Ar. In addition, the peak emission intensity increased with increasing pulse width. Therefore, we suggested that the ionization of Ar was promoted with increasing the pulse width.