HU LI

Speaker, Author, Co-Author

Fri. Mar 17, 2017 9:00 AM - 11:30 AM 313 (313)

Oral presentation
| 8 Plasma Electronics
| 8.4 Plasma etching

[17a-313-1~10] 8.4 Plasma etching

10:30 AM - 10:45 AM

[17a-313-7] Effects of He⁺ ion irradiation on the Etching of Transparent Conduction Oxides

〇HU LI¹, Kazuhiro Karahashi¹, Masanaga Fukasawa², Kazunori Nagahata², Tetsuya Tatsumi², Satoshi Hamaguchi¹ (1.Osaka Univ., 2.Sony)

10:45 AM - 11:00 AM

△ [17a-313-8] First Principle Study on the Effects of Hydrogen on Transparent Conducting Oxide Etching

〇HU LI¹, Pascal Friederich², Karin Fink², Wolfgang Wenzel², Kazuhiro Karahashi¹, Masanaga Fukasawa³, Kazunori Nagahata³, Tetsuya Tatsumi³, Satoshi Hamaguchi¹ (1.Osaka Univ., 2.KIT, 3.Sony)

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