Yoshinori Tokuda

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Speaker, Author, Co-Author

Fri. Mar 17, 2017 9:00 AM - 12:45 PM E206 (E206)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[17a-E206-1~14] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

10:45 AM - 11:00 AM

[17a-E206-8] Influence of Residual Fluorine on Internal Stress of W Thin Films

〇Yoshinori Tokuda¹, Kazunori Harada¹, Satoshi Ishikawa¹, Shunsuke Imaizumi², So Takamoto², Satoshi Izumi² (1.Toshiba, 2.Univ. of Tokyo)