Symposium (Oral)

[16p-315-1~11] Recent GFIS microscopy technology and its future prospects for R & D of materials and devices

Thu. Mar 16, 2017 1:15 PM - 6:00 PM 315 (315)

Hiroshi Mizuta(JAIST), Shinichi Ogawa(AIST)

△：Presentation by Applicant for JSAP Young Scientists Presentation Award
▲：English Presentation
▼：Both of Above
No Mark：None of Above

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1:15 PM - 1:30 PM

▲ [16p-315-1] Welcome to symposium on GFIS ion microscopy and its applications

〇Shinichi Ogawa¹ (1.AIST)

1:30 PM - 2:00 PM

▲ [16p-315-2] The History and New Development of the Helium Ion Microscopy Technology with ZEISS ORION NanoFab

〇Yongkai Zhou¹ (1.Carl Zeiss Microscopy GmbH)

2:00 PM - 2:30 PM

▲ [16p-315-3] Mask Repair Technology using Gas Field Ion Source

〇Anto Yasaka^1,2, Fumio Aramaki¹, Tomokazu Kozakai¹, Osamu Matsuda¹ (1.Hitachi High-Tech Science, 2.Hitachi High-Technologies)

2:30 PM - 2:45 PM

▲ [16p-315-4] A study on fabrication characteristics of gold films using focused helium ion beam

〇Etsuo Maeda¹, Tomohiko Iijima², Shinji Migita², Shinich Ogawa², Reo Kometani¹ (1.Univ. of Tokyo, 2.AIST)

2:45 PM - 3:00 PM

▲ [16p-315-5] Development of nanofiber Bragg cavities using helium ion microscope

〇Hideaki Takashima¹, Atsushi Fukuda¹, Hironaga Maruya¹, Yusuke Iwabata¹, Andreas Schell¹, Shigeki Takeuchi¹ (1.Kyoto Univ.)

3:00 PM - 3:30 PM

▲ [16p-315-6] Neon GFIS Gas Assisted Etch and Beam Induced Deposition -Characterization for Semiconductor Applications-

〇Richard H. Livengood¹, Shida Tan¹, Roy M. Hallstein¹, Waqas Ali¹ (1.Intel Corporation)

3:45 PM - 4:15 PM

▲ [16p-315-7] Single-nanometer patterning of graphene by HIM for advanced applications

〇Hiroshi Mizuta¹, Marek Schmidt¹, Teruhisa Kanzaki¹, Shinichi Ogawa², Manoharan Muruganathan¹ (1.JAIST, 2.AIST)

4:15 PM - 4:45 PM

▲ [16p-315-8] Nanofabrication of superconducting devices with focused helium ion irradiation

〇Shane Cybart¹ (1.UC Riverside)

4:45 PM - 5:15 PM

▲ [16p-315-9] Direct nano-patterning of graphene by Anderson localization

〇Yuichi Naitou¹, Sinichi Ogawa¹ (1.AIST)

5:15 PM - 5:45 PM

▲ [16p-315-10] Charge transport control in graphene by helium ion irradiation and patterning

〇Shu Nakaharai¹ (1.NIMS)

5:45 PM - 6:00 PM

▲ [16p-315-11] Interaction of gas field ionized nitrogen with silicon

〇(P)Marek Edward Schmidt¹, Xiaobin Zhang¹, Yoshifumi Oshima¹, Le The Anh¹, Anto Yasaka², Teruhisa Kanzaki¹, Manoharan Muruganathan¹, Masashi Akabori¹, Tatsuya Shimoda¹, Hiroshi Mizuta¹ (1.JAIST, 2.Hitachi High-Tech Science Corp.)

Sessions

Symposium » Recent GFIS microscopy technology and its future prospects for R & D of materials and devices