[16a-E206-1~13] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[16a-E206-6] Development of Water Plasma Ashing Technology for Minimal Fabrication System

〇Takeshi Aizawa¹, Takeshi Yamada¹, Mitsunori Nogawa¹, Yasuhiro Onishi¹, Noriko Miura^1,3, Tatsuo Ishijima², Takuya Kitano², Hiroaki Suzuki², Arufa Shiota², Sommawan Khumpuang^3,4, Shiro Hara^3,4 (1.Yonekura MFG., 2.Kanazawa Univ., 3.Minimal, 4.AIST)

Keywords:minimal, ashing