[17p-P3-1~22] 15.4 III-V-group nitride crystals

[17p-P3-10] Growth of AlN films by DC reactive sputtering method using high-vacuum sputtering apparatus

〇Masatoshi Itoh¹, Shigeru Saito¹ (1.Tokyo Univ. of Sci.)

Keywords:Aluminum nitride, sputtering