Takashi Hamano

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Speaker, Author, Co-Author

Thu. Sep 20, 2018 1:45 PM - 7:15 PM 438 (3F_Lounge)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20p-438-1~21] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

5:15 PM - 5:30 PM

△ [20p-438-14] A Characterization Technique of Plasma Process-Induced Latent Defects in Si Substrate by Isothermal Capacitance Transient Spectroscopy

〇Takashi Hamano¹, Keiichiro Urabe¹, Koji Eriguchi¹ (1.Kyoto Univ.)