Kazuhiro Karahashi

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Speaker, Author, Co-Author

Thu. Sep 20, 2018 1:45 PM - 7:15 PM 438 (3F_Lounge)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20p-438-1~21] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

3:30 PM - 3:45 PM

[20p-438-8] SiO₂ and Si etching reactions by SFx⁺ ion bombardment

〇Kazuhiro Karahashi¹, Tomoko Ito¹, Junichi Hashimoto², Mitsuhiro Omura², Hisataka Hayashi², Satoshi Hamaguchi¹ (1.Graduate School of Engineering, Osaka Univ., 2.Toshiba Momory Corporation)