Naoto Kameda

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Speaker, Author, Co-Author

Fri. Sep 21, 2018 9:00 AM - 11:30 AM 145 (Reception Hall)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[21a-145-1~9] 13.3 Insulator technology

9:30 AM - 9:45 AM

[21a-145-3] Properties of a CVD-SiO₂ film at room temperature by active species from high purity ozone gas

〇Naoto Kameda¹, Toshinori Miura¹, Yoshiki Morikawa¹, Mitsuru Kekura¹, Ken Nakamura², Hidehiko Nonaka² (1.Meidensha corp., 2.AIST)