Tetsuya Goto

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Speaker, Author, Co-Author

Fri. Sep 21, 2018 9:00 AM - 12:00 PM 233 (233)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[21a-233-1~12] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

11:45 AM - 12:00 PM

[21a-233-12] Silicon Nitride Film Formations Using Magnetic-Mirror Confined Plasma CVD Equipment for Minimal Fab System

〇Tetsuya Goto¹, Seiji Kobayashi², Yuki Yabuta³, Shigetoshi Sugawa¹, Shiro Hara^4,5 (1.Tohoku Univ., 2.Kotec, 3.Seinan Industries, 4.AIST, 5.MINIMAL)