The 79th JSAP Autumn Meeting, 2018

Presentation information

Poster presentation

13 Semiconductors » 13.7 Compound and power electron devices and process technology

[18p-PA6-1~30] 13.7 Compound and power electron devices and process technology

Tue. Sep 18, 2018 4:00 PM - 6:00 PM PA (Event Hall)

4:00 PM - 6:00 PM

[18p-PA6-25] Reduction in contact resistance on n-type AlN by formation of graded-AlGaN cap layer: Influence of polarization charge in graded AlGaN layer

Masanobu Hiroki1, Kazuhide Kumakura1 (1.NTT BRL)

Keywords:AlN

We have found the reduction in effective contact resistance of n-type AlN using graded AlGaN layer. In this study, the relationship between the graded-AlGaN thickness and the electrical conductivity is clarified. We found the decrease in the conductivity with increasing the graded-layer thickness. It probably resuts from the incrase in the density of negative charge induced by polarization doping.