The 79th JSAP Autumn Meeting, 2018

Presentation information

Poster presentation

13 Semiconductors » 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[18p-PB2-1~7] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

Tue. Sep 18, 2018 1:30 PM - 3:30 PM PB (Shirotori Hall)

1:30 PM - 3:30 PM

[18p-PB2-4] A Study on Thick Au Proof-Mass for High-Performance MEMS Accelerometer

Tatsuya Koga1, Daisuke Yamane1, Toshifumi Konishi2, Teruaki Safu2, Shinichi Iida2, Hiroyuki Ito1, Noboru Ishihara1, Katsuyuki Machida1, Kazuya Masu1 (1.Tokyo Tech, 2.NTT-AT)

Keywords:MEMS, Multi-layer metal technology, High sensitivity

We have developed the high sensitive MEMS accelerometer using multi-layer metal technology.
In order to realize the high performance MEMS accelerometer, we investigated the thickness of Au with proof mass for the wide detection range. This paper describes the experimental evaluation results from the proposed device.