The 79th JSAP Autumn Meeting, 2018

Presentation information

Oral presentation

21 Joint Session K » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[19a-224A-1~8] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Wed. Sep 19, 2018 9:30 AM - 11:30 AM 224A (224-1)

Takumi Ikenoue(Kyoto Univ.)

10:00 AM - 10:15 AM

[19a-224A-3] Estimation of electric field in β-Ga2O3-based MOS photodiodes

Makoto Hashikawa1, Sansei Tomizawa1, Kohei Sasaki2, Akihito Kuramata2, Toshiyuki Oishi1, Takayoshi Oshima1 (1.Saga Univ., 2.Tamura Corp. & NCT, Inc)

Keywords:Ga2O3

Because band edge absorption begins with approximately 270nm, in β-Ga2O3, application is expected to a light detecting element having light of the sun window shade properties. However, as for the reported element, a lot of Schottky Barrier Diode (SBD) leak to date at opposite direction voltage time to apply it, and the avalanche amplification is not seen because an electric current is big. Therefore I introduced the concept of the metal insulator semiconductor (MIS) and succeeded in controlling a leak electric current and became able to apply a high electric field. Because I estimated the internal electric field of the diode by simulation this time, I report it.