Preparation of HfO<sub>2</sub>-based ferroelectric thick film by sputtering method and their electrical property

Presentation information

Oral presentation

6 Thin Films and Surfaces » 6.1 Ferroelectric thin films

Wed. Sep 19, 2018 1:45 PM - 7:00 PM 133 (133+134)

Tomoaki Yamada(Nagoya Univ.), Takeshi Yoshimura(Osaka Pref. Univ.), Takashi Eshita(Wakayama Univ.), Hiroshi Naganuma(Tohoku Univ.)

6:30 PM - 6:45 PM

〇Reijiro Shimura¹, Takanori Mimura¹, Takao Shimizu¹, Hiroshi Funakubo¹ (1.Tokyo Tech. SMCT)

Keywords:ferroelectric film, HfO2