The 79th JSAP Autumn Meeting, 2018

Presentation information

Oral presentation

21 Joint Session K » 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[20a-234A-1~11] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

Thu. Sep 20, 2018 9:00 AM - 12:00 PM 234A (234-1)

Takashi Yasuda(Ishinomaki Senshu Univ.)

9:15 AM - 9:30 AM

[20a-234A-2] Anomalous carrier transport of tin-doped In2O3 thin films irradiated with negative oxygen ions

Yutaka Furubayashi1, Hisashi Kitami1,2, Toshiyuki Sakemi2, Kimio Kinoshita2, Makoto Maehara2, Hisao Makino1, Tetsuya Yamamoto1 (1.Kochi Univ. Tech., 2.Sumitomo Heavy Industries, Ltd.)

Keywords:Indium oxide, electrical transport properties, grain boundaries

Sn-doped In2O3 (ITO) is widely applied to transparent conducting films because of its high optical transparency and high electrical conductivity. Normally, as a model of ITO polycrystalline films for discussing their electrical transport, it would be taken into account that conducting crystal grains are separated by barriers (grain boundaries) with finite distances In this case, the Hall mobility (µH) should be smaller than the optical mobility (µopt). On the other hand, we found the conditions with which ITO films irradiated by oxygen negative ions (O-) had a relationship of µH > µopt . Because µH contains the effects on the carrier transport by grain boundaries, we have to discuss the possibilities that electrical paths exist also in grain boundaries.