[20a-234A-1~11] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[20a-234A-5] Low Temperature Formation of ZnO Films by Plasma-Assisted Mist-CVD

〇Tomotaka Kido¹, Tomoki Mikuriya¹, Rena Sugino¹, Yasutaka Nisi², Makoto Nakazumi², Koichiro Iwahori², Zenji Yatabe^1,3, Takao Namihira^1,4, Yusui Nakamura^1,5,6 (1.GSST Kumamoto Univ., 2.Nikon Corporation, 3.POIE Kumamoto Univ., 4.IPPS Kumamoto Univ., 5.FAST Kumamoto Univ., 6.Phoenics)

Keywords:Transparent conductive film