[20p-221C-1~15] 15.6 Group IV Compound Semiconductors (SiC)

[20p-221C-13] Quartz surface coating by Y₂O₃ film for SiC epitaxial reactor cleaning using ClF₃ gas

Ryohei Kawasaki¹, Yasuhiro Umetsu², Keisuke Kurashima¹, Kohei Shioda¹, Asumi Hirooka¹, 〇Hitoshi Habuka¹ (1.Yokohama Nat. Univ., 2.Techno-Quartz, Inc.,)

Keywords:ClF3 gas, Y2O3, Coating film

Anti-corrosive nature of Y2O3 film to ClF3 gas was evaluated, when Y2O3 was used for coating quartz glass surface.