Jungsoo Lee

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Speaker, Author, Co-Author

Tue. Mar 20, 2018 9:00 AM - 11:30 AM E201 (57-201)

Oral presentation
| 21 Joint Session K
| 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

[20a-E201-1~9] 21.1 Joint Session K "Wide bandgap oxide semiconductor materials and devices"

10:45 AM - 11:00 AM

△ [20a-E201-7] Removal of Si surface impurities from β-Ga₂O₃ (100) substrate by using wet etching

〇Jungsoo Lee¹, Ryo Wakabayashi¹, Kohei Yoshimatsu¹, Motohisa Kado², Akira Ohtomo^1,3 (1.Tokyo Tech., 2.Toyota Motor Corp., 3.MCES)