Masaki Hasegawa

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Speaker, Author, Co-Author

Mon. Mar 19, 2018 1:45 PM - 6:15 PM C204 (52-204)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[19p-C204-1~17] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

2:45 PM - 3:00 PM

△ [19p-C204-5] Elucidation of radical adsorption mechanism for atomic layer etching of gallium nitride

〇Masaki Hasegawa¹, Takayoshi Tsutsumi¹, Atsushi Tanide^1,2, Hiroki Kondo¹, Kenji Ishikawa¹, Masaru Hori¹ (1.Nagoya Univ., 2.SCREEN Holdings Co., Ltd.)

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