Hiroyuki Tanaka

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Speaker, Author, Co-Author

Tue. Mar 20, 2018 1:45 PM - 4:45 PM C101 (52-101)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[20p-C101-1~11] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

3:45 PM - 4:00 PM

[20p-C101-8] Analysis of micro loading effect in minimal ICP deep trench etching

〇Hiroyuki Tanaka^1,2, Hisato Ogiso^1,2, Shizuka Nakano^1,2, Yoshiyuki Nozawa^2,3, Toshihiro Hayami^2,3, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.SPPT)

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