Symposium (Oral)

[19p-G201-1~10] Visualizing a brilliant future for Japanese semiconductor industry & Research

Mon. Mar 19, 2018 1:15 PM - 5:35 PM G201 (63-201)

Osamu Nakatsuka(Nagoya Univ.), Noriyuki Taoka(AIST)

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1:15 PM - 1:20 PM

[19p-G201-1] Opening remark

〇Noriyuki Taoka¹ (1.AIST)

1:20 PM - 1:50 PM

[19p-G201-2] Advanced Imaging Device Technologies and the Future for Sensing Technologies

〇Koji Neya¹, Hidenobu Tsugawa¹, Itaru Oshiyama¹, Yoshiki Ebiko¹, Keiji Tatani¹, Keiichi Ohno¹, Hiroyuki Miwa¹ (1.Sony Semiconductor)

1:50 PM - 2:20 PM

[19p-G201-3] Present and Future of Foundry Business in Japan

〇Mitsuaki Igeta¹ (1.MIE FUJITSU SEMICONDUCTOR)

2:20 PM - 2:50 PM

[19p-G201-4] Solution Business That Renesas Aims for and Device Technology to Realize It

〇Kazuhiro Ohnishi¹ (1.Renesas)

2:50 PM - 3:20 PM

[19p-G201-5] Development of Si-based devices with multi-function and high-reliability for the social problems solution

〇Kunihiko Iwamoto¹ (1.ROHM Co., Ltd.)

3:30 PM - 4:00 PM

[19p-G201-6] Material / device research as a key to realize future memory technologies

〇Shosuke Fujii¹ (1.Toshiba Memory Corp.)

4:00 PM - 4:30 PM

[19p-G201-7] Innovation of device development in the age of “More than Moore”

〇Takumi Mikawa¹ (1.Pansonic Semiconductor Solutions)

4:30 PM - 5:00 PM

[19p-G201-8] Recent Resesarch and Development of SiC Power Devices

〇Munetaka Noguchi¹ (1.Mitsubishi Electric Corp.)

5:00 PM - 5:30 PM

[19p-G201-9] Utilization of semiconductor 200 mm line for IoT era - NEDO FY2015 "Survey on the actual situation of domestic semiconductor manufacturing lines and examination of effective utilization methods" Report

〇Yasuroh Iriye¹, Noriyuki Ishihara¹ (1.MHIR)

5:30 PM - 5:35 PM

[19p-G201-10] Closing remark:

〇Katsunori Makihara¹ (1.Nagoya Univ.)

Sessions

Symposium » Visualizing a brilliant future for Japanese semiconductor industry & Research