[17p-C101-1~6] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[17p-C101-5] Low Temperature Crystallization using BLDA for PECVD Si films without de-hydrogenation

〇Takashi Noguchi¹, Yuya Ishiki¹, Futa Gakiya¹, Tatsuya Okada¹, Taro Morimura², Atsushi Ota², Yasushi Nishikata² (1.Univ.f the Ryukyus, 2.ULVAC Inc.)

Keywords:semiconductor, CVD