The 65h JSAP Spring Meeting, 2018

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13 Semiconductors » 13.3 Insulator technology

[17p-F206-1~17] 13.3 Insulator technology

Sat. Mar 17, 2018 1:45 PM - 6:15 PM F206 (61-206)

Tomo Ueno(TUAT), Akio Ohta(Nagoya Univ.)

4:15 PM - 4:30 PM

[17p-F206-10] Fabrication and Evaluation of HfO2/Si Structure by Chemical Oxidation Method on Metal Hf/Si Structure

〇Hiroki Oba1, Riho Nonaka1, Yoshitaka Iwasaki1, Tomo Ueno1 (1.Tokyo Univ. of Agri. & Tech.)

Keywords:semiconductor