The 65h JSAP Spring Meeting, 2018

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Symposium (Oral)

Symposium » Semiconductor Device Simulation: Applications and Future Perspectives

[18p-A202-1~15] Semiconductor Device Simulation: Applications and Future Perspectives

Sun. Mar 18, 2018 1:15 PM - 6:40 PM A202 (54-202)

Nobuya Mori(Osaka Univ.), Koichi Fukuda(AIST), Akira Hiroki(Kyoto Inst. of Tech.), Kenichiro Sonoda(Renesas), Nobutoshi Aoki(Toshiba Memory)

4:00 PM - 4:30 PM

[18p-A202-7] Device Simulation of Ferroelectric Gate Negative Capacitance Transistors

〇Junichi Hattori1, Koichi Fukuda1, Tsutomu Ikegami1, Hiroyuki Ota1, Shinji Migita1, Hidehiro Asai1 (1.AIST)

Keywords:negative capacitance, ferroelectric, TCAD