The 65h JSAP Spring Meeting, 2018

Presentation information

Oral presentation

13 Semiconductors » 13.5 Semiconductor devices and related technologies

[18p-G203-1~18] 13.5 Semiconductor devices and related technologies

Sun. Mar 18, 2018 1:15 PM - 6:00 PM G203 (63-203)

Masumi Saitoh(TOSHIBA), Kousuke Miyaji(Shinshu Univ.)

1:30 PM - 1:45 PM

[18p-G203-2] Soft Errors in Thin-BOX SOI SRAMs Exposed to Heavy Ion Radiation

Daisuke Kobayashi1, Kazuyuki Hirose1, Taichi Ito2, Yuya Kakehashi2, Osamu Kawasaki2, Takahiro Makino3, Takeshi Ohshima3, Daisuke Matsuura4, Takanori Narita4, Masahiro Kato4, Shigeru Ishii4, Kazunori Masukawa4 (1.ISAS/JAXA, 2.R&D/JAXA, 3.QST, 4.MHI Ltd.)

Keywords:Soft error, Cosmic ray, SOI

The SOI technology is often used to develop devices with low sensitivity to soft errors. Recent technologies have a buried oxide (BOX) layer thinned down to 10 nm, and some of them have a well structure buried underneath it. This buried well structure enables us to use flexibly back bias (VB) conditioning. We recently tested such an SOI technology using radiation beams that simulate cosmic rays and found a hundredfold increase in the soft error sensitivity for a certain VB condition. We would like to share this result and discuss its physics.