Characterization of Electrical Properties of High-k/MoS<sub>2</sub> Fabricating Through ALD

Presentation information

Poster presentation

13 Semiconductors » 13.3 Insulator technology

Sun. Mar 18, 2018 1:30 PM - 3:30 PM P7 (P)

1:30 PM - 3:30 PM

〇WENHSIN CHANG¹, Naoya Okada¹, Hidehiro Asai¹, Koichi Fukuda¹, Toshifumi Irisawa¹ (1.AIST)

Keywords:MoS2, high k, ALD