Change in surface morphology of fluorinated Si surface by Ar ion irradiation

Presentation information

Oral presentation

8 Plasma Electronics » 8.2 Plasma deposition of thin film, plasma etching and surface treatment

Mon. Mar 19, 2018 1:45 PM - 6:15 PM C204 (52-204)

Hisataka Hayashi(TOSHIBA), Yoshihide Kihara(Tokyo Electron Miyagi Limited)

3:00 PM - 3:15 PM

Atsuki Asano¹, 〇Takayoshi Tsutsumi¹, Hiroki Kondo¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (1.Nagoya Univ.)

Keywords:ALE, STM, Si