[20a-C101-1~11] 13.4 Si wafer processing /Si based thin film /Interconnect technology/ MEMS/ Integration technology

[20a-C101-8] Study of TiN Gate SOI-CMOS process by minimal fab

〇Kazuhiro Koga¹, Y. X. Liu², Fumito Imura^1,2, Masashi Kase², Shuichi Noda^1,2, Kazumasa Nemoto², Somawan Khumpuang^1,2, Shiro Hara^1,2 (1.Minimal, 2.AIST)

Keywords:minimalfab, thermal diffusion