[20a-C204-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[20a-C204-6] High-rate synthesis of fluorocarbon film using a concentrated CF₄ gas by sub-atmospheric pressure plasma and evaluation of the film property

〇Tomoyuki Tanaka¹, Kikura Jou¹, Takemoto Hiroki¹, Kakiuchi Hiroaki¹, Yasutake Kiyoshi¹, Ohmi Hiromasa¹ (1.Osaka Univ)

Keywords:plasma CVD, fluorocarbon film