Toshio Hayashi

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Speaker, Author, Co-Author

Wed. Sep 18, 2019 9:00 AM - 12:00 PM C309 (C309)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18a-C309-1~10] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

11:45 AM - 12:00 PM

[18a-C309-10] Electronic properties and dissociation channels of CH₃F

〇Toshio Hayashi¹, Kenji Ishikawa¹, Makoto Sekine¹, Masaru Hori¹ (1.Nagoya university)