Eiji Kusano

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Speaker, Author, Co-Author

Wed. Sep 18, 2019 1:45 PM - 5:15 PM C309 (C309)

Oral presentation
| 8 Plasma Electronics
| 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18p-C309-1~13] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

3:45 PM - 4:00 PM

[18p-C309-8] Negative plasma potential in Mg-CF₄ direct current reactive sputtering discharge

〇Eiji Kusano¹ (1.Kanazawa Inst.Technol.)