Ryotaro Kiga

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Speaker, Author, Co-Author

Wed. Sep 18, 2019 1:45 PM - 4:15 PM E304 (E304)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[18p-E304-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

2:00 PM - 2:15 PM

[18p-E304-2] Reduction of boron diffusion by fluorine in pre-amorphized Si

〇Ryotaro Kiga¹, Masashi Uematsu¹, Kohei Itoh¹ (1.Keio Univ.)