Hideaki Tanimura

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Speaker, Author, Co-Author

Wed. Sep 18, 2019 1:45 PM - 4:15 PM E304 (E304)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[18p-E304-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

2:15 PM - 2:30 PM

[18p-E304-3] Diffusion control of n-type dopants in Ge with high activation using co-implantation and flash lamp annealing

〇Hideaki Tanimura¹, Hikaru Kawarazaki¹, Takayuki Aoyama¹, Shinichi Kato¹, Yoshihide Nozaki¹, Ryota Wada², Takahiro Higuchi², Tsutomu Nagayama², Takashi Kuroi² (1.SCREEN Semiconductor Solutions, 2.NISSIN ION EQUIPMENT)

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