Mana Otani

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Speaker, Author, Co-Author

Wed. Sep 18, 2019 1:45 PM - 4:15 PM E304 (E304)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[18p-E304-1~10] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

3:00 PM - 3:15 PM

[18p-E304-6] Silicon epitaxial growth using dichlorosilane for minimal CVD reactor

〇Mana Otani¹, Toshinori Takahashi¹, Mitsuko Muroi¹, Hitoshi Habuka¹, Shin-ichi Ikeda^2,3, Yuuki Ishida^2,3, Shiro Hara^2,3 (1.Yokohama Nat. Univ., 2.MINIMAL, 3.AIST)

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