Shuichi Noda

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Speaker, Author, Co-Author

Thu. Sep 19, 2019 1:45 PM - 5:15 PM E304 (E304)

Oral presentation
| 13 Semiconductors
| 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[19p-E304-1~13] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

4:45 PM - 5:00 PM

[19p-E304-12] Film Characteristics deposited by Minimal Fab TiN Reactive Sputtering Tool (3)

〇Shuichi Noda¹, Kazuhiro Koga², Kazumasa Nemoto¹, Yuuki Yabuta³, Naoko Yamamoto³, Ryuichiro Kamei³, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.AIST, 2.MINIMAL, 3.Seinan-kogyo)

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