Shinji Yamada

→ Search for Shinji Yamada in Google Scholar

Speaker, Author, Co-Author

Fri. Sep 20, 2019 1:30 PM - 5:35 PM E301 (E301)

Symposium (Oral)
| Symposium (technical)
| Etching Technology for Nitride Semiconductors: recent progress in high-controllable and low-damaging process

[20p-E301-1~9] Etching Technology for Nitride Semiconductors: recent progress in high-controllable and low-damaging process

3:50 PM - 4:20 PM

[20p-E301-6] Reduction of plasma-induced damage in ICP-RIE of n-type GaN by controlling bias power

〇Shinji Yamada^1,2,3, Hideki Sakurai^1,2,3, Yamato Osada³, Toshiyuki Nakamura³, Ryuichiro Kamimura³, Jun Suda^1,2, Tetsu Kachi¹ (1.Nagoya Univ. IMaSS, 2.Nagoya Univ., 3.ULVAC ISET)

▲