The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

13 Semiconductors » 13.5 Semiconductor devices/ Interconnect/ Integration technologies

[18a-B11-1~11] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

Wed. Sep 18, 2019 9:00 AM - 12:00 PM B11 (B11)

Masumi Saitoh(Toshiba Memory)

9:00 AM - 9:15 AM

[18a-B11-1] Critical role of thermal runaway in VO2 voltage-induced metal-insulator transition

Takeaki Yajima1,2, Tomonori Nishimura1, Takahisa Tanaka1, Ken Uchida1, Akira Toriumi1 (1.Univ. of Tokyo, 2.JST PRESTO)

Keywords:Joule heat, volatile resistance switching

In the voltage-induced metal-insulator transition in VO2, the critical current is approximately constant as a function of the environmental temperature while the critical voltage is strongly varied. This constant critical current can be exploited for the thermally stable application of VO2 even around the transition temperature. In this research, we elucidate the origin of the constant critical current is, not the metal-insulator transition itself, but rather the thermal runaway due to the Joule heat.