The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

13 Semiconductors » 13.4 Si processing /Si based thin film / MEMS / Equipment technology

[18a-E304-1~9] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

Wed. Sep 18, 2019 9:30 AM - 11:45 AM E304 (E304)

Seiichiro Higashi(Hiroshima Univ.), Tatsuya Okada(Univ. of the Ryukyus)

10:30 AM - 10:45 AM

[18a-E304-5] In-situ Monitoring for Visualization of Temperature Distribution in Molten Region on a-Si film during Atmospheric Pressure Thermal Plasma Jet Irradiation

Yuri Mizukawa1, Asaki Kameda1, Hiroaki Hanafusa1, Seiichiro Higashi1 (1.Hiroshima Univ.)

Keywords:Atmospheric Pressure Thermal Plasma Jet, Non-contact Temperature Measurement