The 80th JSAP Autumn Meeting 2019

Presentation information

Oral presentation

13 Semiconductors » 13.5 Semiconductor devices/ Interconnect/ Integration technologies

[18p-B11-1~14] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

Wed. Sep 18, 2019 1:15 PM - 5:00 PM B11 (B11)

Masaharu Kobayashi(Univ. of Tokyo), Shinji Migita(AIST), Hitoshi Wakabayashi(Tokyo Tech)

1:45 PM - 2:00 PM

[18p-B11-3] Data of "PN-Body-Tied SOI-FET" manufactured using 65 nm thin BOX FDSOI

Keita Daimatsu1, Jiro Ida1, Takuya Yamada1, Takayuki Mori1 (1.Kanazawa Inst.)

Keywords:ultra low power devices, steep slope devices, SOI-FET

We have proposed "PN-Body-Tied (PNBT) SOI-FET" as a new device to realize ultra-low power consumption LSI and have reported a steep SS less than 1mV / dec. So far, PNBT SOI-FET was fabricated by 200 nm SOI technology. In this stady, we made a PNBT SOI-FET for the first time by using 65 nm thin BOX FDSOI process and confirmed a steep SS below 1 mV / dec.