2019年第80回応用物理学会秋季学術講演会

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一般セッション(口頭講演)

15 結晶工学 » 15.3 III-V族エピタキシャル結晶・エピタキシーの基礎

[18p-B31-1~16] 15.3 III-V族エピタキシャル結晶・エピタキシーの基礎

2019年9月18日(水) 13:15 〜 18:00 B31 (B31)

赤羽 浩一(NICT)、藤川 紗千恵(東京電機大)、小島 信晃(豊田工大)

13:30 〜 13:45

[18p-B31-2] Metallic selenides as the buffers for GaAs grown on Si (111)

〇(PC)YUCIAN WANG1、Nobuaki Kojima1、Kei Kawakatsu1、Akio Yamamoto1、Yoshio Ohshita1、Masafumi Yamaguchi1 (1.Toyota Technological Institute)

キーワード:metal selenides, twin formation, GaAs/Si

Growth of heteroepitaxial GaAs layers on Si substrates is attractive because of its possible application for monolithically integrated electronic and optoelectronic devices. For the GaAs grown on Si or Ge (111), there are several potential merits to extend their applications. In this study, the crystalline improvement of GaAs grown on metal (Ga or In) selenides films is studied. We have found that the inevitable bonding between Ga and Se on the top of In2Se3 was observed. Further, the wettability of the GaAs nucleus has been improved by irradiating Ga2Se3 surface with As, Ga, and Se simultaneously. The twin-domain less than 2% for 1 μm-GaAs grown on an In2Se3/Si (111)4o off-cut to [11-2] has been achieved by introducing Ga2Se3 on In2Se3 with the subsequent (As-Ga-Se) treatment.