[19a-E304-1~12] 13.4 Si processing /Si based thin film / MEMS / Equipment technology

△ [19a-E304-7] A Study on SCD Electrodes for Au-Proof-Mass 3-axis MEMS Accelerometer (2)

〇Takashi Ichikawa¹, Shota Otobe¹, Ken Atsumi¹, Tatsuya Koga¹, Daisuke Yamane¹, Shin-ichi Iida², Hiroyuki Ito¹, Noboru Ishihara¹, Katsuyuki Machida¹, Masato Sone¹, Kazuya Masu¹ (1.Tokyo Tech, 2.NTT-AT)

Keywords:MEMS Accelerometer, Multi-layer metal technology, high resolution

This paper describes relationships between the sensitivity of Au proof-mass tri-axis MEMS (Microelectromechanical systems) accelerometer and the structure parameter of SCD (segmented capacitance detection) electrode. We have proposed SCD for high resolution Au proof-mass MEMS accelerometers. The SCD is useful to simplify the MEMS structures. We investigate analytical equations to obtain the sensitivity. As a result, it is revealed that the sensitivity changes as a function of the SCD structure parameter.