10:15 AM - 10:30 AM
[19a-E305-6] Interface dipole modulation in HfO2/TiO2/SiO2 structures prepared by ALD
Keywords:HfO2, memory, ALD
Oral presentation
13 Semiconductors » 13.3 Insulator technology
Thu. Sep 19, 2019 9:00 AM - 12:15 PM E305 (E305)
Shosuke Fujii(Toshiba Memory), Yasushi Hotta(Univ. of Hyogo)
10:15 AM - 10:30 AM
Keywords:HfO2, memory, ALD