2:00 PM - 2:30 PM
▲ [19p-E302-2] Helium Ion Beam Lithography with High Patterning Fidelity
Keywords:helium ion beam, lithography, patterning fidelity
Presentation information
Symposium (Oral)
Symposium (technical) » Advanced ion microscopy? Application for future nano scale materials and devices
[19p-E302-1~8] Advanced ion microscopy? Application for future nano scale materials and devices
Thu. Sep 19, 2019 1:30 PM - 5:30 PM E302 (E302)
Shu Nakaharai(NIMS), Reo Kometani(Univ. of Tokyo), Hiroshi Mizuta(JAIST), Shinichi Ogawa(AIST)